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KONTAKT CHEMIE Positiv 20 Resist 200ml Aerosol
Kontakt Chemie Positive 20 is a liquid photo-positive resist based on o-naphto-chinon-diazide and Novolack, used to produce printed circuit boards.
Technical Information
- UN Number 1950 CL2.1
- Commodity Code 32089091
- Country of Origin Belgium
Data Sheets
Download the KONTAKT CHEMIE Positiv 20 Resist 200ml Aerosol technical data sheet (TDS) and the KONTAKT CHEMIE Positiv 20 Resist 200ml Aerosol safety data sheet (SDS) from Silmid today. Once you have logged in or signed up, the datasheet will be visible for download if one is available. Please login to access DatasheetsProduct Information
It is a traditional liquid photo-resist that transfers patterns directly onto materials for processing through etching. The resist effectively withstands strong acidic etching products but can be easily removed using solvents like esters, ketones, or aqueous alkalines. The photo-sensitivity of the resist is highest in the close ultra-violet range (UVA). Hence, it should be applied under yellow light or in dimmed daylight. This product finds its primary application in producing printed circuit boards."
Shipping information
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